AMAT P5000 MXP Plus Chamber

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Used AMAT P5000 MXP Plus Chamber

AMAT CENTURA 5200 MXP Plus etch system

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Used AMAT CENTURA 5200
AMAT CENTURA 5200 for sale Included: - main frame, - one MXP+ chamber body, - power AC rack, - ...

TEL ACT8 2C1D Coater Developer

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Used TEL ACT8 2C1D Coater Developer
Negative type polyimide specification Selling as is where is Currently in the fab The buyer is...

2007 Sokudo Co., Ltd. RF-300A

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Used 2007 Sokudo Co., Ltd.	 RF-300A
Sokudo Co., Ltd. RF-300A Multi Block (Resist Coater/Developer) Currently Configured for 300mm wa...

2000 ESCO LTD. EMD-WA1000S

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Used 2000 ESCO LTD. EMD-WA1000S
ESCO Ltd. EMD-WA1000S Temperature Desorption Analyzer Currently Configured for 200mm wafer size...

Nikon AMI-3500

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Used Nikon AMI-3500
Nikon AMI-3500 EQUIPMENT DETAILS: Tool is in a clean room. Equipment Type: AMI-3500 Model:AMI...

JEOL JWS-7555

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Used JEOL	 JWS-7555
JEOL JWS-7555 SEM - Defect Review (DR) Currently Configured for 200mm wafer size MFG Date: TBC...

2001 Tokyo Electron Ltd. NS 300

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Used 2001 Tokyo Electron Ltd.	 NS 300
Tokyo Electron Ltd. NS 300 Wafer Scrubber MFG Date: 2001 EQUIPMENT DETAILS: • Currently Config...

Tokyo Electron Ltd. Trias Ti/TiN Chamber

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Used Tokyo Electron Ltd. Trias Ti/TiN Chamber
Tokyo Electron Ltd. Trias Ti/TiN Chamber Parts/Peripherals Currently Configured for 300mm wafer ...

2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide

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Used 2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide
Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace Currently Configured for 300m...

Aviza Technology, Inc. RVP-300

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Used Aviza Technology, Inc. 	RVP-300
Aviza Technology, Inc. RVP-300 Vertical Diffusion Furnace Currently Configured for 300mm wafer ...

Applied Materials Centura AP Enabler

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Used Applied Materials 	Centura AP Enabler
Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size ...