2013 Tokyo Electron Ltd. TELINDY Plus IRAD Oxide
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Description
Tokyo Electron Ltd. TELINDY Plus IRAD Oxide Vertical LPCVD Furnace
Currently Configured for 300mm wafer size
MFG Date: 2013
EQUIPMENT DETAILS:
Inspect to confirm configuration and condition.
Configuration :
Software Version : Ver.6.07
System Controller is Model 780
The last PM date is 2016/09/24
Off-line date is 2017/11/06
Can produce wafers as is
All cables are present
Platform Type is TELINDY PLUS I-RAD
Process Type is Gate Oxide / SiO2
Temperature Range is Mid Temp 500-800 C
Wafer Handling :
Wafer Type is 300 mm
Carrier Type is 25 slot
Carrier Stage Capacity is special
WTU Type is 1+4 Edge Grip
Production Wafers qty are 100
Boat Operation is 1 Boat Type
Gas Panel Configuration :
MFD Make is ADVANCED ENERGY
Gas MFC-Model MFC-Size
N2 MFC-NX 50 SLM
O2 MFC-O1 20 SLM
HF MFC-XF1 5 SLM
N2 MFC-N1 10 SLM
Gas MFC-Model MFC-Size
N2 MFC-N2 10 SLM
N2 MFC-N3 5 SLM
N2 MFC-N4 10 SLM
N2 MFC-NL 1000 SLM
N2 MFC-NBS 400 SLM
N2 MFC-NR 500 SCCM
Reactor Configuration :
Quartz Material is Electric Fused
Quartz Provide is TEL
Process TUBE is I Red TUBE
TUBE Sealing is special O-ring
Boat Type is 117 slot
Boat Material is Quartz
Pedestal Type is Quartz
Auto shutter is shutter purge type
Edwards-IXH3030T Vacuum pump is included
Specifications
Manufacturer | Tokyo Electron Ltd. |
Model | TELINDY Plus IRAD Oxide |
Year | 2013 |
Condition | Used |
Stock Number | em1189 |
WAFER SIZE | 300mm |