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2005 KLA TENCOR eS32
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Wafer Mask Inspection Parts Machine KLA ES32 (1) - Stage, electron source, feed throughs includ...
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1996 Applied Materials 5200 Centura Dry Etch Cluster Tool
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There are four chambers; 3 MxP+ oxide and 1 DPS poly Applied Materials 5200 Centura Dry Etch Clu...
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1995 TEL Mark-8 CLEAN Track System 2-Coater/2-Developer
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Missing parts: FC-9821Ke Controller Robotic arm assembly and board ADH/Adhesion Unit 4x LHP u...
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TEL / TOKYO ELECTRON Mark Vz 2D Developer
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2-Developer, no-missing parts
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TEL / TOKYO ELECTRON Clean Track Mark 7 Photo Resist Coat System
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See attached configuration file below. 2-coAter, 3-spiner, no-missing parts WAFER SIZE: 200mm
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2015 Air Liquide M2000 Slurry Mixer
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This is a 2015/2016 unit
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2002 AMAT ENDURA CL
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Ask for details
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TEL ACT 8 type II controller
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See video Operational 3 Months warranty WAFER SIZE: 200mm
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2006 Applied Materials Endura II Liner/Barrier
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Applied Materials Endura II Liner/Barrier PVD (Physical Vapor Deposition) Currently Configured f...
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1993 DNS SC-W60A-AV
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OEM: DaiNippon Screen MFG Co., Ltd. Model: SC-W60A-AV Vintage: Nov. 1993 Config: 2-Coater
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2000 AMAT Centura Phase II eMxp+ 3 Chambers
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All OEM original parts and components
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ASM P-CVD Eagle12
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