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2009 ISM Industry Services N.A.
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Stainless steel workbench with ultrasonic bath for the removing of photoresisted silicon-wafers. ...
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2016 Ind Solution S/B IN. D IV3010
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Condition Good Year of Manufacture 2016 Exterior Dimensions Width 84.134 in (213.7 cm) Depth 5...
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1998 Hitachi S 5000 Field Emission Scanning Electron Microscope
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- Ultra High Resolution - Accelerating Voltage: 30 kV - Magnification: 500,000x Performance -...
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Hamamatsu C7103 Back Side Polishing System
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Description:PC Controlled IC Back-side Lapping and Wafer Grinding System Version:200 mm and pack...
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Ohmiker 80B
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The Ohmiker-80B System is specifically designed for high throughput and long-term reliability pe...
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2017 Hiller DP484/11012/FD HILLER DECAPRESS DP
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- Technic special customized for Infineon? no - Any damages/deficits known? no - Manuals existing...
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2017 Hanmi Laser Cleaning 1.0
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Description LASER CLEANING_HANMI LASER CLEANING 1.0_HLC001 Accessories 2 X Buffer and Vacuum box...
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2003 FICO FICO AMSi-204
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Condition Good Year of Manufacture 2003 Exterior Dimensions Width 145.669 in (370.0 cm) Depth ...
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2016 ESSEM TEC Convection Reflow Oven
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Model Convection Reflow Oven Description REFLOW OVEN soldering station Year of Manufacture 2016...
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2005 ESPEC TSA-201SW
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Condition Fair Year of Manufacture 2005
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STS / SPTS MESC Multiplex AOE ICP
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Wafer Size: 4", 6"
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Fuji AIMEX III C
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FUJI AIMEX III C With H24G headx2pcs and 10pcs 8mm feeder H08M head x 2 with Tray unit 10pcs 8mm...
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