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1994 Nanometrics 4000
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Nanometrics 4000 Film Thickness Measurement System Model Number 7200-1821 Rev B 150 mm Wafer Co...
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2011 RUDOLPH MetaPulse-III 300XCu
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2011 RUDOLPH MetaPulse-III 300XCu Metal Thickness WAFER SIZE: 12
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1996 RUDOLPH FE-VII
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1996 RUDOLPH FE-VII Film Thickness WAFER SIZE: 8
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2003 Leica INS 3300 DUV
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Leica INS3300 is the most advanced solution in the production control of 200 mm and 300 mm wafers...
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Lam Research 2300 Exelan
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Lam Research 2300 Exelan WAFER SIZE: 300
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Axcelis Rapidstrip 320
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Axcelis Rapidstrip 320 WAFER SIZE: 300
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Axcelis Rapidstrip 320ES
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Axcelis Rapidstrip 320ES WAFER SIZE: 300
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2008 Applied Materials Centura EPI
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AMAT Centura EPI WAFER SIZE: 300mm
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DNS / DAINIPPON SK-80BW-AVPF (2) Coater / (2) Developer system, 6"
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DNS / DAINIPPON SK-80BW-AVPF (2) Coater / (2) Developer system, 6" (4) Load ports (4) LH Units ...
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Alcatel AD63KH
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AD63KH Alcatel Dry Pump
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Karl Suss MJB3 Mask Aligner
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Mask aligner with vacuum contact, proximity or soft contact alignment modes. 365 to 400nm spectr...
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Toyota Industries Corporation T100L
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T100LToyota Industries Corporation Dry Pump Support Equipment (Fab)
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