DEK International GALAXY Flux & Ball Placement Module

CHAD Mate200 Automation Ball Placement system

To perform lamination after dicing process in array form

LAMINATORE PER FOTOP MOD.360 N

Wafer Size: 6 inch TEGAL 901 DRY ETCH Poly/SiNSiC Gases used; SF6-N2-CHF3-He-O2 Mass flow UNIT UF...

Verteq Single Rinser/Dryer 1800-50 (Cobalt), 8" x3 sets available Download specs: Verteq_Specs

Nanometrics Nanospec/AFT Model 200

Verteg Single Rinser/Dryer 1800-50 (Dry Only), 8"

Verteq Single Rinser/Dryer 1800-50 (Gen. Etch Bench), 8"

Semitool ST-270D Rinser/Dryer, 5"

Verteq Automated Hot Phosphoric Acid Plastic Bench

Reynoldstech Stainless Steel Pourous Silicon Etch Wet Bench