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2002 DNS 80B
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Condition: as is Wafer size: 8" Process: track
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AMAT P5000
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Process: Preclean Etchx1, Oxide CVD x2 Condition: as is Wafer size: 8"
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ASML Yieldstar-S1250
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Process: Overlay Measurement Condition: as is Wafer size: 12"
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2004 Rudolph AXI-S
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Process: Macro Defect Inspection Condition: as is Wafer size: 12"
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2009 Rudolph MP3 300XCu
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Process: Thickness Measurement Wafer size: 12" Condition: as is
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2011 Camtek AIM1 (Xact200)
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Process: analyzing Condition: as is
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Affinity PWG-060K-BE44CBD2 Water Cooled Chiller, 30222, Heat Exchanger
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2007 Seiko NS 7000 Handler
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Vintage: 2007 (see images for specs)
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2008 Nanometrics 9010 (Mask & Wafer Inspection)
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Working condition
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2015 ESPEC PVHC 232M (clean oven)
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Toray Oxygen Thermometer Working condition
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2015 Olympus MK61-F Metallurgical Microscope
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Eye Piece: SWH10 x /26.5 Objective lens: MpanFLN x5 x10 x20 Working Condition
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Varian XM 2000
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