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2008 TEL TRIAS
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Category: thin film CVD Process: PECVD-Oxynitride Wafer size: 300mm
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2006 TEL Indy
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Process: DIFFUSION Wafer Size: 300mm Category: diffusion Equipment: furnace Process: anneal
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2011 TEL INDY PLUS
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Process: DIFFUSION Wafer Size: 300mm Equipment: furnace Process: HfO2-ALD
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2007 Ulvac NE-5700
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Wafer Size: 150mm Category: Etch Process: Metal Etcher Equipment: Dry Etcher
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2010 WONIK IPS AKRA
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Wafer size: 12" Process: Ti/TiN Category: Thin film Equipment: CVD
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SSEC 203
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Wafer Cleaner
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2011 Lam Vector Express AHM
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Wafer size: 300mm Process: PECVD Category: Thin film
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2003 TEL TRIAS
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Wafer Size: 300mm Process: CVD Category: Thin film
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2007 TEL INDY
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Process: DIFFUSION Wafer Size: 300mm Category: Diffusion Furnace Process: ALD SiN
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2008 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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2010 WONIK IPS MAHA SP
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Wafer size: 12" Category: Thin film CVD
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2006 AMAT CENTURA AP
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Wafer Size: 300mm Process: ETCH Category: Etch
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