1994 Nanometrics 4000

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Used 1994 Nanometrics  4000
Nanometrics 4000 Film Thickness Measurement System Model Number 7200-1821 Rev B 150 mm Wafer Co...

2011 RUDOLPH MetaPulse-III 300XCu

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Used 2011 RUDOLPH   MetaPulse-III 300XCu
2011 RUDOLPH MetaPulse-III 300XCu Metal Thickness WAFER SIZE: 12

1996 RUDOLPH FE-VII

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Used 1996 RUDOLPH  FE-VII
1996 RUDOLPH FE-VII Film Thickness WAFER SIZE: 8

2003 Leica INS 3300 DUV

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Refurbished 2003 Leica  INS 3300 DUV
Leica INS3300 is the most advanced solution in the production control of 200 mm and 300 mm wafers...

Lam Research 2300 Exelan

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Used Lam Research 2300 Exelan
Lam Research 2300 Exelan WAFER SIZE: 300

Axcelis Rapidstrip 320

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Used Axcelis Rapidstrip 320
Axcelis Rapidstrip 320 WAFER SIZE: 300

Axcelis Rapidstrip 320ES

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Used Axcelis Rapidstrip 320ES
Axcelis Rapidstrip 320ES WAFER SIZE: 300

2008 Applied Materials Centura EPI

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Used 2008 Applied Materials Centura EPI
AMAT Centura EPI WAFER SIZE: 300mm

DNS / DAINIPPON SK-80BW-AVPF (2) Coater / (2) Developer system, 6"

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Used DNS / DAINIPPON SK-80BW-AVPF (2) Coater / (2) Developer system, 6"
DNS / DAINIPPON SK-80BW-AVPF (2) Coater / (2) Developer system, 6" (4) Load ports (4) LH Units ...

Alcatel AD63KH

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Used Alcatel AD63KH
AD63KH Alcatel Dry Pump

Karl Suss MJB3 Mask Aligner

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Used Karl Suss MJB3 Mask Aligner
Mask aligner with vacuum contact, proximity or soft contact alignment modes. 365 to 400nm spectr...

Toyota Industries Corporation T100L

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Used Toyota Industries Corporation T100L
T100LToyota Industries Corporation Dry Pump Support Equipment (Fab)