Process: HTO Vintage: 2006

Process: HTO Vintage: 2015

Process: Resistivity Measurement Wafer size: 8, 12" Condition: as is

Process: thickness measurement Wafer size: 12" Condition: as is

Process: microscope Wafer size: multi Condition: as is

Process: sputter coater Condition: working Wafer size: multi

Process: CHIP breaking M/C Condition: as is Wafer size: 8"

Process: microscope Condition: as is Wafer size: multi

Process: resistivity measurement Wafer size: 12" Condition: as is

Process: lift off M/C Condition: as is Wafer size: 4"

Process: sputter coater Condition: working Wafer size: multi

Process: lifetime measurement Condition: complete