2002 FEI Nova Nanolab 200 dual beam

Process Type: FA SEMs/TEMs/Dual Beams

Date of Manufacture: 2002

Electron Column

High-resolution Field Emission SEM Column

Monopole magnetic immersion lens

Schottky thermal field emitter

60-degree objective lens

Heated objective apertures

Resolution

1.1 nm @ 15 kV

2.5 nm @ 1 kv

Digital image processor

ION COLUMN

MAGNUM ion column with Ga liquid metal ion source

Source lifetime 1500 hours

Resolution 7 nm ( 5 nm achievable)

Accelerating voltage 5 -30 kV

Probe current 1 pA to 20 nA in 15 steps

Beam blanker

15 position aperture strip

Minimum etch line width (Si) < 15 nm

Maximum hole aspect ration 10:1

Digital pattern generator

Detectors

In lens SE detector (TLD-SE)

Everhardt Thornley SED

IR CCD

Direct Ion Detector (CDEM)

Gas chemistries

Platinum metal deposition

Tugsten metal deposition

Enhanced edge deposition (XeF2)

Carbon deposition

Additional injectors available

Vacuum system

1x 240 l/s TMP oil free

1x PVP oil free XDS 10

3x IGP for electron and ion column 3

Chamber vacuum < 2.6e-06 mbar

Evacuation time < 5 min

Chamber

379 mm left to right

21 port

5 mm E and I beam coincidence point = Analytical WD

Angle between the electron and ion column is 52º

5-axis motorized stage

Y= 50 MM

X= 50 MM

Z= 25 MM

CELARANCE = MAX 55 MM TO EUCENTRIC POINT

T= -15º TO + 60 º

R = n x 360 º

Minimum stet 300 nm

Repeatability @ 0º: 2 µm

Repeatability @ 52º: 4 µm

System control

32 bit graphical user interface Windows 2000 with keyboard, mouse, multifunctional control pane