PLASMA-THERM 790 Reactive Ion Etcher

PLASMA-THERM 790 Reactive Ion Etcher

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Description

  • Manually Loaded Process Chamber with 8” (dia.) Cathode
  • Gas Distribution Panel with 4ea Gas Channels
  • MKS 1479 Metal Sealed Mass Flow Controllers
  • 4ea Additional Gas Channels Available
  • RFPP RF5S RF Generator: 500W @ 13.56MHz
  • RFPP AMN-5 Auto Matching Network
  • RFPP AMNPS-2A Auto Matching Network Controller
  • Leybold TMP 361 Turbomolecular Pump
  • Leybold NT 150/360 Turbomolecular Pump Controller
  • EquipmentWorks 2.6 Application SW
  • Industrial PC Running UBUNTU LINUX OS, Intel I7 CPU at 3.4 GHz,16Gb RAM & 500GB SSD
  • All Analog & Digital I/O Modules Controlled by BECKHOFF Ethernet I/O Via Modbus TCP/IP Communications Protocol.
  • All I/O Modules Available from BECKHOFF Automation and are Plug & Play Compatible
  • All Pneumatic Valves Controlled by SMC Modules Via Modbus TCP/IP Communications Protocol
  • All SMC Pneumatic Valves Available from SMC USA
  • Standard 21” Flat Panel Monitor, Keyboard & Mouse
  • Edwards QDP40 Dry Roughing Pump
  • NESLAB HX-75 Chiller
  • Electrical Disconnect Box - 208V, 60Hz, 3 Ph
  • System Fully Refurbished & Ready for Demonstration
  • Guaranteed to Meet or Exceed OEM Specifications


Specifications

ManufacturerPLASMA-THERM
Model790 Reactive Ion Etcher
ConditionUsed
Stock NumberGOD23082023720223382