Karl MA56 Mask Aligner

The Karl Suss MA 56 is a mask alignment and exposure system which offers unsurpassed, highly economical mass production capabilities for cassette to cassette handling of wafers up to 4" wafers and 5" masks, although smaller wafers and chips may be mounted to a 4" carrier wafer and processed.  The light sources are a 30 W Deuterium lamp with 310 nm wavelength and a 350 W mercury arc lamp with 365 nm wavelength.  The vacuum contact mode is available. The microscope has dual alignment objectives and split-field viewing.  The mask and microscope have motorized motion in x and y, and they may be moved together or independently over the stationary wafer.