1999 Axcelis Eaton NV GSD-HE - 1 MeV Ion Implanter

1999 Axcelis Eaton NV GSD-HE - 1 MeV Ion Implanter

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Description

Axcelis (Eaton), NV GSD-HE, 1 MeV Ion Implanter, Vintage 1999 and Completely Refurbished in 2023. 6” Wafer Handling Station Installed and Compatible with 8” Wafers. Tool is currently uncrated in a cleanroom environment. Full specs are available on request.


Following the rebuild and refurbishment, the tool was assembled and completed FAT in France. Then it was disassembled/cleaned, crated and shipped its current location in Asia. It was un-crated and moved to the cleanroom, but we never proceeded to do the installation. It will save a step, as it does not need to be disassembled/cleaned before crating. The tool was verified to be operational and it successfully performed multi-step implant recipe during FAT. It’s currently set up for 6” and can be converted to 8”.


The tool was subject to a full refurbishment program to bring it to an as-new status:

·       Replacement of both the Source and Beamline turbo pumps with corrosion resistant pumps

·       Replacement of both front and rear Cryo-pumps by the OEM

·       Replacement of valves, gate valves and vacuum gauges

·       Replacement of the Mechanical pumps and booster pumps

·       Chamber and beamline CO2 cleaned and then diamond polished to return to as-new condition.

·       Complete refurb of resonant cavities (LINACs, resonator DI boards and RF power supplies)

·       Two new SAC IHC ion sources

·       Replacement of high voltage power supplies

·       Replacement of terminal power supplies (filament, bias, arc, magnet, source magnet, etc

·       Replacement of all gas box elements

·       Refurbishment of isolation transformer

·       All assembly refurbished and fitted with new consumables.

·       All water lines and fittings replaced

·       Pneumatic lines inspected and replaced where required.

·       System tested to Original Equipment Manufacturers specification

The tool is currently configured for 6” wafers, but it can be converted back to 8” wafers.

A low pressure H2 upgrade was performed:

·       High level of safety: No stored H2, but on demand instant generation

·       No gas stock management

·       Very simple and easy-going technology

·       Beam performances similar to H2 pressure technology

·       Fully CE compliant


Specifications

ManufacturerAxcelis Eaton
ModelNV GSD-HE - 1 MeV Ion Implanter
Year1999
ConditionRefurbished
Stock NumberBM4019