NIKON NSR-SF200

As-is, Where-is

. Wafer size : 150mm

. Handedness : Inline left or right

configuration available

. Altitude : Varies by site

. Chamber type : Standard

. Chamber temperature set point :

. Variable numerical aperture : Max 0.63

. sPURE

. Resolution Enhancement Technology(RET)

-Options

. RET apertures iNA=

0.50, 0.38, 0.24, 0.19, 0.12, 0.38(Annual)

. Quick Reticle Change (QRC)

. Reticle Size : 6 inches

. Reticle Barcode Reader - Options

. Field Image Alignment system (FIA)

. Laser Step Alignment system (LSA)

. Phase Contrast FIA

. TTLFC2

. Pre-alignment 2

. Wafer stage : Air Bearing/Linear Motors

. Ceramic wafer holder

. Wafer loader

. Chip leveling included

. Multipoint Focus/Level

. Extended wafer carrier table - Options

. Pellicle particle Detector - Options

. Online

. Nikon SECS II GEM interface

. Gigaphoton KrF Excimer Laser Source