1994 Varian E500-HP

Configuration

Chuck Type: ESC

Upgraded Gasbox to SDS Capabilities. Has (2) SDS sticks and (2) high pressures.

OEM Model Description

E500HP is a Medium Current Ion Implanter which processes one or two cassettes of wafers as a batch, a single wafer at a time.

1.) General Information

Wafer Size 150mm 150mm

Signal Tower Front (Red, yellow, green) Front (Red, yellow, green)

Production Wafer Qty' 1 wafer (single platen) 1 wafer (single platen)

Platen Type Mechanical Clamp Electrostatic Clamp

Loadloack Left/Right 2 Chambers Left/Right 2 Chambers

S/w version 12.10.21 13.30 Rev C

Implant Monitor LCD Touchscreen LCD Touchscreen

Service Monitor LCD Touchscreen LCD Touchscreen

2.) System Vacuum

Ion Source Chamber CCIG/Torr CCIG/Torr

Beamline Chamber CCIG/Torr CCIG/Torr

End Station Chamber CCIG/Torr CCIG/Torr

3.) Pumps

Source Dry Punp iQDP80 iQDP80

Stage Pump iQDP80+QMB500 iQDP80+QMB500

Loadlock Rough Pump iQDP80 iQDP80

Loadlock Turbo Pump CTI100 CT4L & CT4R P/N: 8108998G001 & 8108999G001 

Process Chamber CT-10 CT250 P/N: 8039113

Source Turbo Pump Leybold MAG W 1300C Pfeiffer TPH1201P P/N: PMP03702 Resolver Turbo Pump Pfeiffer HiPace 300 Pfeiffer HiPace 300

Beamline Turbo Pump Pfeiffer TMH521YP Pfeiffer HiPace 700