1996 Axcelis/ Eaton Nova NV 8200 Implanter

8"

- Energy config.: from 3 to 250keV (single); up to 750 keV (triple)

- Wafer size 200mm with holders for different wafers sizes

- Dose: > 1E11at/cm²

- Beam current: I < 1mA

- Gas lines:

- 4 process gas lines (BF2/PH3/AsH3/Hydrogen)

- 1 gas line (Argon)

- Ion sources: 3 ion sources with dual vaporizer on each source

- Magnet: Dipole magnet 90° - Buckley Systems – de 0 a 75 AMU in full charge

- Target positioning/ scanning system:

- Parallel beam

- Electrostatic angle correction programmable

- Tilt 0°-60°

- End station:

- Flat/notch alignment with buffet cassette (3 cassette positions)

- 3 axis robotic

- Pick & Place system

- Cryo compressor: CTI Cryogenics 9600

- Turbo pumps:

- Edwards STP 1003C for Source

- Pfeiffer HiPace 300 + Pfeiffer TPH 1201 P for Beam Line

- Rough pumps:

- Adixen A 103 P for Source

- Adixen A 103 P for Beam Line

- Alcatel/Adixen ADS 602 P for End Station

- Clamp type: Electrostatic clamp

- Soft: SPARC V

- Non-functional modules: PC remote

1996 Vintage