2006 Axcelis Optima MD

Description Medium Current Implant

Year of Manufacture 2006

Wafer size: 300mm

Fab section: diffusion

Software version: 1.7.0.4.DP14

CIM: GEM

Process: implant

Main system: optima ion implant system (300mm)- 1

Main system: end station- 1

Handler system: linear scan system- 1

Handler system: Yaskawa XY-RC400M-A00 tobot ATM- 2

Options system: CTI cryo pump system 2x IS 320- 2

Option system: CTI cryo pump system 1x IS8, 2x IS 250- 3

Options system: BUSCH BC100 rough pumps source / LL+ transfer- 2

Options system: 300mm plasma flood gun w. HP Xe DIN 6

Others: Line 1 string: HP Argon 1/4" VCR

Others: Line 5 string: SDS GeF4 1/4" VCR

Others: Line 2 string: SDS PH3 1/2" VCR

Others: Line 6 string: HP Xe DIN 6

Othes: Line 3 string: SDS AsH3 1/2" VCR

Cryo compressor- 2

Affinity chiller- 1