2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

Model Year : 2003

Quantity :   1

Condition : Refurbished with OEM specifications

Supports wafer sizes up to 300mm (330mm Platen)

RIE set up for GaN Etch

RF Power: 600W, 13.56MHz

Water cooled electrode 10C-80C

Load Lock with turbo pump

End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 6 lines including following MFCs:

Ar   – 100sccm

CL  – 100sccm

BCL3 – 100sccm

N2O – 100sccm

Windows PC, User friendly interface

This tool was removed from production October 2014.

Chiller, Pump are not included.