Oxford Plasmalab 80 Plus PECVD tools

2x available

PECVD 80+ SiO2 Dep

• Non-functional tool but can be repaired (requires Silane MFC)
• Designed for 4” wafers but can do 6”
• Deposits SiO2 & SiH4 @ 300C
• All MFCs for above processes are operational bar the Silane one
• Is an OIPT tool but has bespoke software. Built 1995, software upgrade 2010
• No burner gas abatement
• Control PC
• Edwards E2M80 vacuum pump
• Rf Generator

• PECVD 80+ SiNx Dep
• Functional tool
• Designed for 4” wafers but can do 6”
• Deposits SiO2, SiH4 & Amorphous Si @ 300c
• Has working MFCs to achieve above deposition
• Is an OIPT tool built 1998
• Burner gas abatement
• Control PC
• Edwards E2M80 vacuum pump
• Rf Generator