2009 FEI Helios Nanolab 400

Process Type: Wet Processing

Date of Manufacture: 2009 

Status of Equipment: Refurbished

• Elstar FEG Electron column, 350v–30kV

• In-lens SE and BSE detector and STEM

• Elstar Electron column is capable of sub-nanometer STEM images

• Sidewinder Ion column: 30kV • Milling Power: 21nA beam current

• CDEM with 5nm image resolution

• Windows OS and FEI UI; TSS networking computer to make IT happy

• Five-axis motorized compucentric stage with load lock

• Specimen Coverage: 100mm diameter

• Load Lock

• Chamber scope for real time observation

• Gas Injection System (GIS): Max 4 injectors 2 included, chemistry of choice

• GIS chemistries - W and XeF2

• Plasma Cleaner