1999 Nikon S-204B

Tool Status Power-On & Initialized

Wafer Size 200 mm

Fab Section Lithography

Asset Description NIKON DUV SCANNER

Software Version MCSV S3.42G, OCSV S3. 43, Maint-V

S370-XX3260, Base-kit

BASEXX301-0008T, WLDRX3062-

V340A, RLDR8SF12-V280A

CIM SECS

Process MASKING

Hardware Configuration (fab):

Main System Main Body -1

Main System Cymer Laser ELS-6400 -1

Main System PCB Control Rack -1

Handler System Wafer Loader Type 3 -1

Factory Interface SMIF -2

Software

MCSV S3.42G Main Communication Software

OCSV S3.43 Online Communication Software

Maint_V S370-XX3260 Maintenance Menu Software

Base-kit BASEXX301-0008T Tool Basekit Software

WLDRX3062-V340A Wafer Loader Software

RLDR8SF12-V280A Reticle Loader Software

Hardware

DMCC (Digital) workstation ETM25-SA

Dual HardDisk Size (DKA100 and DKA0) 9.1GB Each

LCD monitor Display

Interferometer VME unit PCB boards

Lens Controller (LC) unit PCB boards

Alignment Controller (ALG) unit PCB boards

Operation Desk (OPD) unit PCB boards

Stage Controller (STG) unit PCB boards

SCSI (S/G) unit PCB boards

Reticle Loader (RL) unit PCB boards

Wafer Loader (WL) unit PCB boards

LSA laserhead 3225H-PCN

Reticle Stage Inferferometer laser 5517D C07 (5517DL)

Wafer Stage Inferferometer laser 5517D C06

Reticle indexer (2 units) SMIF Type Indexer R150

Cymer Laser ELS-6400

Consummable

Halogen lamp SE-0257120