Solitec 5110 Single Head Wafer Processing Photoresist Spin Coate

Designed to coat wafers, masks and substrates.

Simple design for low maintenance easy serviceability and high up-timer.

Acceleration 1,000 to 40,000 rpm/sec.

Digital display/timer with manual programming.

Capable of 9 in. round, 6 in. square or 9 in. diagonal for rectangular substrate. 120V.

Does not include resist dispense pump or parts.