Ulvac Entron W-200T6 PVD Sputtering Tool
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Description
2006 tool. Ulvac PVD/CVD. Can be reconfigured to 6 PVD chambers.
Entron W-200T6 System (1E3T2H) – Full Acceptance
1 x Chemical Dry Pre-Clean Chamber
1 x Anneal Chamber for Chemical Dry Pre-Clean Chamber
1 x Anneal Chamber for Post Anneal
1 x PVD-Ni (Ring-Ni) Chamber
1 x PVD-TiN (Normal) and 1 x PVD Co (Normal) Chambers
Quotation also includes:
Open Cassette Buffer Station
2 Sets of Spare Shields per Chamber
Host Communications (SECS/GEM); S2 Safety
Customer Supplied Items:
Normal TiN Target
Normal Co Target
Normal Ni Target and backing plate (should customer want
to run Normal Ni)
Dry Pumps
Gas Scrubber
Entron W-200T6 System (1E3T2H) – Full Acceptance
1 x Chemical Dry Pre-Clean Chamber
1 x Anneal Chamber for Chemical Dry Pre-Clean Chamber
1 x Anneal Chamber for Post Anneal
1 x PVD-Ni (Ring-Ni) Chamber
1 x PVD-TiN (Normal) and 1 x PVD Co (Normal) Chambers
Quotation also includes:
Open Cassette Buffer Station
2 Sets of Spare Shields per Chamber
Host Communications (SECS/GEM); S2 Safety
Customer Supplied Items:
Normal TiN Target
Normal Co Target
Normal Ni Target and backing plate (should customer want
to run Normal Ni)
Dry Pumps
Gas Scrubber
Specifications
Condition | Used |