1996 AMAT HTF- Centura

Model

EPI5

Wafer Size Range

Minimum

150 mm

Maximum

200 mm

Set Size

200 mm

Number of Chambers

3

Process Capabilities

ATM EPI PROCESS

Chamber 1 Description

HTF ATM EPI

Chamber 2 Description

HTF ATM EPI

Chamber 3 Description

HTF ATM EPI

Controller Type

Microprocessor Controller Type

Software Revision Level

B6.30

Temperature Control

Dual Pyrometer

Power Requirements

480 V 300.0 A 50 Hz 3 Phase

Year of Manufacture

1996

Condition

Good

Software Ver: B6.30

CB1 Amps: 300A

SBC Type: V452

Flow Point Model: Nano Valve

Gas Panel Type: Configurable

Wafer Size: 200mm (with conversion kit 150mm is possible)

M-Monitor: CRT

3 Chambers ATM EPI

With digital Flow-Control of the cooling systems with interlock and passphrase (Simens PLC)

HDD was upgraded to RAID System