1996 Gasonics L3510

1996 Gasonics L3510

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Description

GASONIC L3510 Single Wafer Downstream

Photoresist Asher


8” configured (can change to 6” )


Quartz Plasma Tube and Baffles


ASTEX Microwave 1.2kw


Temperature Controlled


Wafer Cooled


Aluminum Process Chamber


Robotic Pick and Place Wafer Handler ( KORO )


Fixed Position Single Cassette Station


Post Process Cooling Station


Downstream End Point Detection


SEMI SECS ⅱ Software


2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm


System Power : 208 VAC , 60 A, 3 Phase, 50/60Hz

Specifications

ManufacturerGasonics
ModelL3510
Year1996
ConditionUsed
Stock NumberBM3037