2001 STS MESC Multiplex ICP ASE
2001 STS MESC Multiplex ICP ASE
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Description
STS ASE Multiplex ICP System (Bosch Process)
OEM = Surface Technology Systems Limited (AKA: STS)
Model = MESC Multiplex ICP ASE
Type = ICP RIE (Inductively Coupled Plasma, Reactive Ion Etch)
Description of Process = ASE (Advanced Silicon Etch, Bosch Process)
Wafer Size = 150mm
Loader capacity = 2 wafer Carousel
Chuck Type = Mechanical Weighted Clamp
Process Gases:
C4F8 = 300 Sccms
SFG = 600 Sccms
O2 = 100 Sccms
AR = 100 Sccms
Turbo Pump = Leybold Mag 2000 CT
RF Generator 1 = ENI ACG-3
RF Generator 2 = AE RFG 3001 (Advanced Energy)
Vacuum measurement = MKS Instruments
Gate Valve = VAT Throttling Gate Valve
Slit Valve = Vat Slit Valve
Manuals = STS MESC Multiplex ICP Operator’s and Modular Parts Catalogue
Vacuum Pump Loadlock = Edwards Pump E2M40
Vacuum Pump Process Module = Edwards IQDP80 w/IQDB250 Blower (intelligent Interface)
Chiller = Affinity, PWG-060K-BE33CBC2
Specifications
Manufacturer | STS |
Model | MESC Multiplex ICP ASE |
Year | 2001 |
Condition | Used |
Stock Number | GOD10102022 |
WAFER SIZE | 150mm |