Varian 300XP
Varian 300XP
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Description
Configuration
-Implanter: Dual end-stations setup for 6" wafers
-Implant angle: 0 – 7 degrees
-Source type: Freeman ion source
-Scan Amp: Brookhaven X and Y Scan master amplifiers.
-Beam energy probe: 0 -200 KV beam energy probe.
-Beam monitor: Remote beam monitor on control console.
-Extraction: Variable (0 – 35) KV
-Platen: Standard 300XP grounded platen on ES#1 & 2. Corner cup integration
-Source rough pump: Alcatel 2012, 3 phase.
-B/L Rough pump: Alcatel 2012/2008, single phase
-E/S Rough pump: Alcatel 2012/2008, single phase
-LOAD LOCK pump: Alcatel 2012/2008, single phase
-Source Hi-Vac pump: Varian VHS 4 diffusion pump
-VARIAN B/L Hi-Vac pump with CTI-8 Cryo pump
-VARIAN E/S Hi-Vac pump with CTI-8 Cryo pump
-CTI Compressors.
-Accel / Decel power supply kit: standard (-2KV)
-AMU: 0 – 124 amu
-Ion beam filter: N/A but compatible.
-Process control terminal: 486 with remote control console.
-XP scan controller Dosimetry system.
Gas system: 4 gas system (3 MFC, 1 HP for boron) SDS gas control system.
Fiber optic control interface between high voltage terminal and ground level controls.
Specifications
Manufacturer | Varian |
Model | 300XP |
Condition | Used |
Stock Number | GOD05112021 |