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Agilent 81160A Pulse Function Arbitrary Generator
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Process Type: Pulse Generator
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Agilent N5181A MXG RF Analog Signal Generator
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Process Type: signal generator
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Polaron Sputter coater
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Process Type: SEM metal and carbon sputter coater Range sputter coater
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2002 FEI Nova Nanolab 200 dual beam
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Process Type: FA SEMs/TEMs/Dual Beams Date of Manufacture: 2002 Electron Column High-resolutio...
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2018 THERMOFISHER FEI Apreo C LoVac
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Process Type: FA SEMs/TEMs/Dual Beams Date of Manufacture: 2018 Equipment Information: Apreo C...
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Hitachi S-4800-II
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Vintage: 2004/2007 Process Type: FA SEMs/TEMs/Dual Beams Status of Equipment: Refurbished Spec...
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Hitachi S-4700-I w/EDX
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Status of Equipment: Crated Specification: Secondary electron image resolution: 2.1nm at 1kV 1...
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2009 FEI Helios Nanolab 400
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Process Type: Wet Processing Date of Manufacture: 2009 Status of Equipment: Refurbished • Elst...
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FEI Helios 450S Dual Beam
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FEI Helios Nanolab 450 Process Type: FA SEMs/TEMs/Dual Beams Status: Refurbished Specification...
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2017 Modutek Wet Clean Wet Bench
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Process Type: Wet Bench Date of Manufacture: 2017 Phosphoric Acid, detailed configuration attac...
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KLA HRP240 High Resolution Profiler
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Process Type: Metrology & Inspection Status of Equipment: De-installed
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1997 Hitachi S-7800
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Process Type: Metrology & Inspection Wafer Size: 200mm Date of Manufacture: Aug 1997 Status of...
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