2006 KLA SP2

• 200/300mm
• FOUP
• Purchased new in 2007
• Fully operational prior to deinstall; skidded & wrapped.

Here are the specs that the mnfr provided the seller.  Note: there was one change when they made the final order.  The tool is 200/300. 

Sensitivity

Semi M50, 95% capture rate of natural defects, DWO Haze <30ppb DLS, <120ppb SP2

Oblique/Wide

37nm HS / 42nm ST / 47nm HT

Oblique/Narrow

60nm HS / 70nm ST / 80nm HT

Normal/Wide

61nm HS / 68nm ST / 72nm HT

Normal/Narrow

78nm HS / 83nm ST / 93nm HT

Edge Exclusion

>/= 2mm, all tput/ illum modes

Throughput

Steady State, <1000 defect/wafer

Vacuum Handling

Dual FIMS

24wph HS / 49wph ST / 75wph HT

EH

EH Dual FIMS

15wph HS / 30wph ST / 58wph HT

2x200mm Open

2x200mm Open (Initial specs - Not finalized)

40wph HS / 68wph ST / 90wph HT

PSL Size Accuracy

PSL spheres deposited on bare silicon wafers are run on the system and the PSL sizing checked in all TPT, normal & oblique (PUU).

PSL size <50nm  ± 1 nm

For calibrated PSL sizes

PSL size 50nm  ≤ size ≤ 200nm ± 2%

PSL size 200nm  ≤ size ≤ 260nm ± 5%

PSL size > 260nm ± 7%

XY Coord Accuracy

K-T XY calibration wafer, 95th %ile radius

</= um Radius

(after Deskew)

Normal Illumination

13um HS / 18um ST / 28um HT

Oblique Illumination

13um HS / 18um ST / 28um HT

XY Coord Stability

K-T XY wafer verification, 95th %ile radius.  5 data sets over 3 days.

</= um Radius

(after Deskew)

Normal Illumination

19um HS / 22um ST / 32um HT

with XY Autocal Enabled

Oblique Illumination

19um HS / 22um ST / 32um HT

SP2 Published Specifications

All specs are subject to change

Performance Attribute

SP2 Test Conditions

SP2 Specification

Contamination

Tested in Oblique HT only

Frontside, Puck/ Edge

Particle contamination only

</= 0.001 part/cm2/pass >/= 0.07um

BSIM or EH

Requires automatic flipper - 3mm EE

</= 0.001 part/cm2/pass >/= 0.07um

Repeatability

1-time, 10 scans dynamic

Count

Normally test on PSL, bare wafer STR

CVN £ 1% for sum of all defects > 5000

Size

Test 102nm (Oblique), 126nm (Normal) PSL All TPT

CVS £ 1% for 102 and 126nm PSL wafer

Reproducibility

5 data sets, 3 scans each, over 3 days

Count

Normally test on PSL, bare wafer STR

CVN £ 3% for sum of all defects > 5000

Size

Test 102nm (Oblique), 126nm (Normal) PSL All TPT

CVS £ 3% for 102 and 126nm PSL wafer

Front & Back, Metallic Contamination

Test via VPD-ICP-MS

Test at customer site only.  Backside for EH.

1E10 atoms/cm2/pass per element

Matching

Capture Rate Method SP2-SP2

InMatch Methodology

Matched HW Config

90%, +/-10% count variability

Testing in progress

Non-matched HW

85%, +/-15% count variability

Haze Repeatability

10 scans, >10% resolution recipe

Haze > 0.133ppm, then CVH £ 2%

All channels

Haze≤ 0.133ppm, then STDH ≤ 0.002ppm

Haze Reproducibility

>10% resolution recipe.  3 scans, 5 data sets over 3 days. 

Haze > 0.100ppm, then CVH ≤ 3%

All channels

Haze ≤ 0.100ppm, then STDH ≤ 0.003ppm