2006 KLA SP2

2006 KLA SP2
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Description
- 200/300mm
- FOUP
- Purchased new in 2007
- Fully operational prior to deinstall; skidded & wrapped.
Here are the specs that the mnfr provided the seller. Note: there was one change when they made the final order. The tool is 200/300.
Sensitivity
Semi M50, 95% capture rate of natural defects, DWO Haze <30ppb DLS, <120ppb SP2
Oblique/Wide
37nm HS / 42nm ST / 47nm HT
Oblique/Narrow
60nm HS / 70nm ST / 80nm HT
Normal/Wide
61nm HS / 68nm ST / 72nm HT
Normal/Narrow
78nm HS / 83nm ST / 93nm HT
Edge Exclusion
>/= 2mm, all tput/ illum modes
Throughput
Steady State, <1000 defect/wafer
Vacuum Handling
Dual FIMS
24wph HS / 49wph ST / 75wph HT
EH
EH Dual FIMS
15wph HS / 30wph ST / 58wph HT
2x200mm Open
2x200mm Open (Initial specs - Not finalized)
40wph HS / 68wph ST / 90wph HT
PSL Size Accuracy
PSL spheres deposited on bare silicon wafers are run on the system and the PSL sizing checked in all TPT, normal & oblique (PUU).
PSL size <50nm ± 1 nm
For calibrated PSL sizes
PSL size 50nm ≤ size ≤ 200nm ± 2%
PSL size 200nm ≤ size ≤ 260nm ± 5%
PSL size > 260nm ± 7%
XY Coord Accuracy
K-T XY calibration wafer, 95th %ile radius
</= um Radius
(after Deskew)
Normal Illumination
13um HS / 18um ST / 28um HT
Oblique Illumination
13um HS / 18um ST / 28um HT
XY Coord Stability
K-T XY wafer verification, 95th %ile radius. 5 data sets over 3 days.
</= um Radius
(after Deskew)
Normal Illumination
19um HS / 22um ST / 32um HT
with XY Autocal Enabled
Oblique Illumination
19um HS / 22um ST / 32um HT
SP2 Published Specifications
All specs are subject to change
Performance Attribute
SP2 Test Conditions
SP2 Specification
Contamination
Tested in Oblique HT only
Frontside, Puck/ Edge
Particle contamination only
</= 0.001 part/cm2/pass >/= 0.07um
BSIM or EH
Requires automatic flipper - 3mm EE
</= 0.001 part/cm2/pass >/= 0.07um
Repeatability
1-time, 10 scans dynamic
Count
Normally test on PSL, bare wafer STR
CVN £ 1% for sum of all defects > 5000
Size
Test 102nm (Oblique), 126nm (Normal) PSL All TPT
CVS £ 1% for 102 and 126nm PSL wafer
Reproducibility
5 data sets, 3 scans each, over 3 days
Count
Normally test on PSL, bare wafer STR
CVN £ 3% for sum of all defects > 5000
Size
Test 102nm (Oblique), 126nm (Normal) PSL All TPT
CVS £ 3% for 102 and 126nm PSL wafer
Front & Back, Metallic Contamination
Test via VPD-ICP-MS
Test at customer site only. Backside for EH.
1E10 atoms/cm2/pass per element
Matching
Capture Rate Method SP2-SP2
InMatch Methodology
Matched HW Config
90%, +/-10% count variability
Testing in progress
Non-matched HW
85%, +/-15% count variability
Haze Repeatability
10 scans, >10% resolution recipe
Haze > 0.133ppm, then CVH £ 2%
All channels
Haze≤ 0.133ppm, then STDH ≤ 0.002ppm
Haze Reproducibility
>10% resolution recipe. 3 scans, 5 data sets over 3 days.
Haze > 0.100ppm, then CVH ≤ 3%
All channels
Haze ≤ 0.100ppm, then STDH ≤ 0.003ppm
Specifications
Manufacturer | KLA |
Model | SP2 |
Year | 2006 |
Condition | Used |
Stock Number | BM5196 |